MEMS/NEMS Technology

Date:09-06-2017   |   【Print】 【close

  The laboratory from its inception in 1987, has been to the microelectronic technology and micromachining technology as the foundation to carry out all kinds of micro sensors and micro system research work, after years of accumulation, the laboratory in silicon bulk micromachining, surface micromachining, quasi non silicon micro machining LIGA processing technology and a variety of advanced packaging technology and Nano Mechanical. The structure of manufacturing is the leading domestic and international advanced technology level.

    In the State Key Laboratory of 1600 square meters purification laboratory, laboratory with double-sided lithography machine, wafer bonding machine, DRIE silicon deep etching machine developed bulk micromachining technology based on diffusion furnace; oxidation, LPCVD LPCVD equipment, plasma enhanced chemical vapor deposition PECVD equipment, gas phase HF sacrificial layer release device, carbon dioxide supercritical point sacrificial layer release device, two phase xenon fluoride at room temperature corrosion of equipment based surface micromachining technology; the metal film sputtering and electron beam evaporation equipment, photoresist spray equipment and metal micro electroplating equipment based LIGA technology; equipment by self assembly has the molecular layer vapor deposition (MVD), focused ion beam etching equipment (FIB), synthesis of nano device specific and sensitive molecular groups, the thickness of nano metal layer by electron beam evaporation The equipment and the low temperature high magnetic field probe operating equipment, etc., have developed the fabrication technology of nano structure, and formed the integration ability of micro and nano fusion based on top down and bottom up

     In addition, laboratory of thousands of young people from the United States to introduce Dr. Tao Hu of the Tufts University opened a new research content, the team will be used as a green silk protein biological photoresist by electron beam, focused on ion beam and laser induced conformational change, combined with the near field infrared imaging and nano nano spectroscopy, correspondence study of silk fibroin in key conformation beta -sheet and material properties, explain the unique "dual glue" phenomenon, and to design, prepare the required protein two-dimensional and three-dimensional nanostructures.

This study further deepens people's understanding of the relationship between the structure and properties of silk protein, expanding its application in micro nano bio green processing field. For the first time using near infrared spectrum imaging and nano bio nano technology, breaking the diffraction limit, the spatial resolution of 10 nm, compared with the traditional infrared optical characterization technique. 2 orders of magnitude higher, can study the electron induced transformation mechanism of silk protein structure in the nanometer scale, reveal the transition of the key conformation of silk protein, and can control the preparation of series of 2D and 3D fibroin nanostructures.

This study explored the structure of protein molecules in electronic or extreme conditions under the action of the transition mechanism of the deep that has important guiding significance and controllable preparation of nano protein structure fields and so on. The study is published in the Nature Communications.

     In addition to integrated manufacturing on the chip, the laboratory developed a sensor of advanced packaging technology. A complete set of packaging technology including device level packaging technology, packaging technology and modular substrate system in package technology, combined with the first step of the chip manufacturing technology, forming a silicon substrate via stacked dense packaging and SIP technology. The laboratory through the introduction of Dr. Gu Jiebin of Imperial College graduate, innovatively developed cryogenic liquid alloy based on direct rapid filling of TSV technology, make full use of the liquid in the capillary micro state, combined with the special nozzle, in the development process at the same time independent research and development of TSV technology and equipment, and ultimately to achieve a high level and low cost TSV Technology (filling effect as shown below).

    During 13th Five-Year, the laboratory will further study based on electron beam of biological materials, focused ion beam lithography and ultrafast laser, the focused ion beam lithography with electron beam lithography together, learn from each other, to realize high precision, multi dimension machining of complex nanostructures. The high precision, the natural biological materials based on multi level large scale green machining technology and related applications.

 

 

 

 

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